Indandatho ye-Ceramic ye-Alumina Ehlanzekile Ephezulu Yezindawo Zokusebenza Ze-CVD / PVD
Indandatho ye-ceramic kaSt.Cera yenzelwe ngqo ukusetshenziswa kumakamelo okucubungula e-CVD (Chemical Vapor Deposition) kanye ne-PVD (Physical Vapor Deposition). Yenziwe nge-99.8% high-purity alumina (Al₂O₃), le ndandatho isebenza njenge-chamber liner, i-focus ring, noma ingxenye ye-process kit ukuvimba i-plasma nokuvikela izindonga zechamber ekugugulekeni. Izinto ezisetshenziswayo zinikeza ukumelana okuhle kwe-plasma, amandla aphezulu e-dielectric (15×10⁶ V/m), kanye nokuqina kokushisa okufika ku-1600°C, okuqinisekisa impilo ende yenkonzo ezindaweni ze-plasma ezisekelwe ku-fluorine. Ukubekezelelana okuqondile kobukhulu (±0.05 mm ku-ID/OD) kanye nokuthamba (≤10 μm) kuvumela ukubeka umphetho we-wafer okuhambisanayo, ukuthuthukisa ukufana kokubekwa kanye nokunciphisa ukukhiqizwa kwezinhlayiya.
Imininingwane (ngokusekelwe ku-99.8% Al₂O₃):
| Impahla | Inani |
| Izinto | I-Alumina engu-99.8% (Ivory) |
| Ubuningi | 3.93 g/cm³ |
| Ukumuncwa Kwamanzi | 0% |
| Amandla Okugobeka | 361 MPa |
| Ukuqina Kokuphuka | 3–4 MPa·m¹/² |
| Ukuqina kukaVickers | 16 GPa |
| I-Modulus kaYoung | 380 GPa |
| Ukuqhuba Okushisayo | 32 W/m·k |
| Ukwanda Kokushisa (25–1000°C) | 7.2×10⁻⁶/℃ |
| Amandla e-Dielectric | 15×10⁶ V/m |
| Ukumelana Okuqondile | >10¹⁴ Ω·cm |
| Izinga Lokushisa Eliphezulu Lokusebenza | 1600°C |
Izicelo:
- · Izindandatho zokugxila zegumbi le-CVD kanye nezindandatho ezisemaphethelweni
- · Izindandatho zesivikelo segumbi le-PVD kanye nezindandatho ze-clamp
- · Ama-etch chamber liner kanye nama-cover rings
- · Izindandatho zokubopha i-plasma ezinhlelweni ze-dielectric etch
Inqubo Yokukhiqiza:
Ukucindezela kwe-isostatic → umshini oluhlaza → ukuthungwa ku-1600°C → Ukugaya kwe-CNC ID/OD → ukugoqa ubuso → ukuhlanza nge-ultrasonic → ukuhlolwa kwe-CMM okungu-100%. Ukuqeda ubuso okubushelelezi kakhulu (Ra ≤0.4 μm) kunciphisa ukunamathela kwezinhlayiya.
Ikhwalithi yokulawula:
- · Ukuhlolwa okungu-100% (ID, OD, ukujiya, ukuba yisicaba)
- · Ukuhlolwa kokuqhekeka kwedayi kobuso obuncane
- · Ukuhlolwa kwamandla e-dielectric ngokwe-ASTM D149
- · Akukho mbala obonakalayo noma ama-porosity ngaphansi kwe-microscope engu-20 ×
Izinzuzo ngaphezu kwezindandatho zensimbi noma ze-quartz:
- · Isikhathi sokuphila eside esingu-5–10× kunezindandatho ze-aluminium ku-fluorine plasma
- · Akukho ukungcoliswa kwensimbi kumafilimu amancane
- · Ukumelana okuphezulu kwe-plasma kune-quartz (akukho migodi yokuguguleka)
- · Igcina ukuvikela ugesi >10¹⁴ Ω·cm ngisho nangemva kokusetshenziswa isikhathi eside
Izinto Ezihlukile — I-Silicon Nitride (Si₃N₄):
Ngezinhlelo zokusebenza ezidinga ukuqina okukhulu kokuphuka (6.2 MPa·m¹/²) kanye nokumelana okungcono kokushaqeka kokushisa (i-expansion coefficient 3.2×10⁻⁶/℃), izindandatho ze-Si₃N₄ ziyatholakala. Kodwa-ke, i-alumina ishibhile kakhulu kuzinhlelo zokusebenza eziningi ze-CVD/PVD. Sicela ucacise okuthandayo ngezinto lapho u-oda.
Ukwenza ngokwezifiso:
- · Izimbobo ezidlulayo, amaphrofayili ezitebhisi, noma ama-counterbore okufaka
- · Ubuso obumbozwe yi-Y₂O₃ ukuze kuthuthukiswe ukumelana kwe-plasma (ongakukhetha)
- · Ukuqoshwa nge-laser kwenombolo yengxenye / ikhodi yelothi
Qaphela:Idatha engenhla ilandela ngokuqinile ithebula lempahla le-Al₂O₃ elinikeziwe. Ngezindandatho ze-Si₃N₄, bheka ishidi ledatha le-Si₃N₄ elihlukile elinikeziwe.
