I-Alumina-Based Porous Ceramic Vacuum Chuck Yokuphatha I-Thin Wafer
I-chuck ye-alumina esekwe ku-St.Cera eyenziwe nge-al₂O₃ engu-99.6% ehlanzekile kakhulu enezimbobo ezivulekile ezilawulwayo ezingama-30–45% kanye nosayizi wembobo ofanayo osukela ku-10 kuya ku-50 μm. Ngokungafani nama-chuck anezimbobo, ubuso obunezimbobo buhlinzeka nge-vacuum esakazekile kuyo yonke i-wafer ngemuva, kususa ukumaka komphetho futhi kuvumela ukubamba ngobumnene ama-wafer amancane kakhulu (≤100 μm) noma asontekile. Izinto zinikeza amandla okuguquguquka angama-≥250 MPa kanye nokuqina kokushisa okufika ku-400°C emoyeni.
Imininingwane(kusekelwe ku-99.6% Al₂O₃):
| Impahla | Inani |
| Izinto | I-Alumina engu-99.6% (Emhlophe) |
| Ukubhoboka | 30–45% (kuyalungiseka) |
| Usayizi Wembobo Emaphakathi | 10–50 μm |
| Amandla Okugobeka | ≥250 MPa |
| Ubuningi | 3.88 g/cm³ |
| Ubude (ngaphezu kuka-200mm) | ≤5 μm |
| Izinga Lokushisa Eliphezulu Lokusebenza | 400°C (umoya) |
| Ukuqedwa Komphezulu | I-Lapped (Ra ≤0.8 μm) |
Izicelo:
- · I-wafer encane (≤50 μm) yokugaya ngemuva
- · Ukufakwa kwe-wafer egobile ukuze kunqunywe
- · Ukuqoqwa kwedayi eyodwa
- · Ukuphathwa kwe-substrate yengilazi
Ukukhiqiza:
Impuphu exutshwe nama-pore formers → ukucindezela kwe-isostatic → ukuthulula ku-1600°C → ukugoqa kuze kube ugqinsi lokugcina. I-chuck ngayinye ihlolwa ukugeleza kwayo ukuze ithole ukufana kwe-vacuum (ukwehluka kwengcindezi <5%) futhi ihlolwe ukuze kutholakale ukusatshalaliswa kosayizi we-pore (SEM).
Izinzuzo ngaphezu kwama-chuck avamile:
- · Akukho ukumaka ngemuva kwe-wafer noma ukushintsha kwe-die
- · Ibamba ama-wafers anomphetho ofinyelela ku-500 μm
- · Indawo ezihlanza yona (izikhala ziyamelana nokuvaleka)
- · Ukusekelwa okufanayo kuqeda ukucindezeleka kwendawo
Cukuvumelanisa:
Izimo eziyindilinga noma eziyisikwele, ububanzi obungu-100–450 mm. Indandatho yokuvala umphetho iyatholakala ukuze ilawulwe nge-vacuum enezindawo.
Cela isampula yosayizi we-wafer yakho ethile.
